Multilayer coating and test of the optics for two new 10X microstepper extreme-ultraviolet lithography cameras

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 4, 2001, Pages 1219-1228

  Montcalm, Claude ^a   Spiller, Eberhard ^a   Weber, Frank J ^a   Wedowski, Marco ^a   Folta, James A ^a   Gullikson, Eric M ^b  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CAMERAS; COATING TECHNIQUES; INTERFEROMETRY; MAGNETRON SPUTTERING; OPTICAL MULTILAYERS; PHOTOLITHOGRAPHY; PROJECTION SYSTEMS; REFLECTION; SURFACE ROUGHNESS;

CONDENSER OPTICS; EXTREME-ULTRAVIOLET LITHOGRAPHY CAMERAS; MICROSTEPPER; NUMERICAL APERTURE; PROJECTION OPTICS; SECONDARY OPTICS;

OPTICS;

EID: 0035535261     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (21)

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