Gas discharged based radiation source for EUV-lithography

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 449-452

  Lebert, R ^a   Bergmann, K ^a   Schriever, G ^a   Neff, W ^b  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DISCHARGE LAMPS; ELECTRIC DISCHARGES; LASER PRODUCED PLASMAS; ULTRAVIOLET LAMPS;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0033132511     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00034-9     Document Type: Article

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