Formation and micromachining of Teflon (fluorocarbon polymer) film by a completely dry process using synchrotron radiation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 3, 1999, Pages 949-956

  Inayoshi, Muneto ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22644449850     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590675     Document Type: Article

References (13)

1. S. Kuper and M. Stuke, Appl. Phys. Lett. 54, 4 (1989);
2. G. B. Blanchet and S. Ismat Shah, ibid. 62, 1026 (1993).
3. R. Srinivasan and B. Braren, Chem. Rev. 89, 1850 (1994).
4. H. Kumagai, K. Midorikawa, K. Toyoda, S. Nakamura, T. Okamoto, and M. Obara, Appl. Phys. Lett. 65, 1850 (1994).
5. E. W. Becker, W. Ehrfeld, P. Gabmann, A. Maner, and D. Munchmeyer, Microelectron. Eng. 4, 35 (1986);
6. R. A. Rosenberg, S. P. Frigo, and J. K. Simons, Appl. Surf. Sci. 79/80, 47 (1994);
7. A. W. Wilson, Solid State Technol. 29, 249 (1986);
8. M. Hori, T. Yoneda, S. Morita, and S. Hattori, J. Electrochem. Soc. 134, 707 (1987).
9. Y. Zhang, T. Katoh, M. Washino, H. Yamada, and S. Hamada, Appl. Phys. Lett. 67, 872 (1995);
10. T. Katoh and Y. Zhang, ibid. 68, 865 (1996);
11. Y. Zhang and T. Katoh, Jpn. J. Appl. Phys., Part 2 35, L186 (1996).
12. M. Inayoshi, M. Ikeda, M. Hori, Y. Goto, M. Hiramatsu, and A. Hiraya, Jpn. J. Appl. Phys., Part 2 34, L1675 (1995).
13. A. Tanaka, J. Electron Microsc. 43, 177 (1994).