EUV absorption in a laser produced plasma source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 507-514

  Kanouff, M ^a   Shields, H ^a   Bernardez, L ^a   Kubiak, G ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Absorption; EUV lithography; Gasdynamics; Laser produced plasma (LPP); Modeling

Indexed keywords

LIGHT ABSORPTION; LITHOGRAPHY; NAVIER STOKES EQUATIONS; NOZZLES; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS;

EXTREME ULTRAVIOLET (EUV) ABSORPTION;

LASER PRODUCED PLASMAS;

EID: 0034763990     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436682     Document Type: Conference Paper

References (10)

1. Scale-up of a cluster jet laser plasma source for extreme ultraviolet lithography
2. Sub-100-nm lithographic imaging with an EUV 10x microstepper
3. Emission from a gas puff target irradiated with a Nd-YAG laser for EUV and X-ray lithography
4. X-ray and extreme ultraviolet emission induced by variable pulse-width irradiation of Ar and Kr clusters and droplets
5. Some characteristics of exhaust plume rarefaction
6. Kinetic theory of source flow expansion with application to the free jet