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Volumn 50, Issue 7, 2003, Pages 1665-1674

Modeling of electron mobility degradation by remote Coulomb scattering in ultrathin oxide MOSFETs

Author keywords

Mobility degradation; Mobility modeling; MOSFET mobility; Remote Coulomb scattering; Ultrathin oxide

Indexed keywords

DEGRADATION; DIELECTRIC DEVICES; ELECTRON MOBILITY; ELECTRON SCATTERING; ELECTRON TRANSITIONS; ELECTRON TRANSPORT PROPERTIES; GATES (TRANSISTOR); POLYSILICON; ULTRATHIN FILMS;

EID: 0043028324     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2003.814973     Document Type: Article
Times cited : (125)

References (38)
  • 2
    • 0021406605 scopus 로고
    • Generalized scaling theory and its application to a 1/4 micrometer MOSFET design
    • G. Baccarani, M. R. Wordeman, and R. H. Dennard, "Generalized scaling theory and its application to a 1/4 micrometer MOSFET design," IEEE Trans. Electron Devices, vol. ED-31, pp. 452-462, 1984.
    • (1984) IEEE Trans. Electron Devices , vol.ED-31 , pp. 452-462
    • Baccarani, G.1    Wordeman, M.R.2    Dennard, R.H.3
  • 3
    • 0008743759 scopus 로고
    • The submicron MOSFET
    • S. Sze, Ed. New York: Wiley, ch. 3
    • J. R. Brews, "The submicron MOSFET," in High-Speed Semiconductor Devices, S. Sze, Ed. New York: Wiley, 1990, ch. 3, p. 139.
    • (1990) High-speed Semiconductor Devices , pp. 139
    • Brews, J.R.1
  • 4
    • 0032275853 scopus 로고    scopus 로고
    • Reliability projection for ultra-thin oxides at low voltage
    • J. Stathis and D. J. DiMaria, "Reliability projection for ultra-thin oxides at low voltage," in IEDM Tech. Dig., 1998, pp. 167-170.
    • (1998) IEDM Tech. Dig. , pp. 167-170
    • Stathis, J.1    DiMaria, D.J.2
  • 6
    • 0033731870 scopus 로고    scopus 로고
    • Ultra-thin oxide reliability for ULSI applications
    • E. Y. Wu, J. H. Stathis, and L.-K. Han, "Ultra-thin oxide reliability for ULSI applications," Semicond. Sci. Technol., vol. 15, p. 425, 2000.
    • (2000) Semicond. Sci. Technol. , vol.15 , pp. 425
    • Wu, E.Y.1    Stathis, J.H.2    Han, L.-K.3
  • 8
    • 0033752184 scopus 로고    scopus 로고
    • Reliability: A possible showstopper for oxide thickness scaling?
    • R. Degrave, B. Kaczer, and G. Groeseneken, "Reliability: A possible showstopper for oxide thickness scaling?," Semicond. Sci. Technol., vol. 15, pp. 436-444, 2000.
    • (2000) Semicond. Sci. Technol. , vol.15 , pp. 436-444
    • Degrave, R.1    Kaczer, B.2    Groeseneken, G.3
  • 9
    • 0035694264 scopus 로고    scopus 로고
    • Impact of gate direct tunneling current on circuit performance: A simulation study
    • Dec.
    • C.-H. Choi, K.-Y. Nam, Z. Yu, and R. W. Dutton, "Impact of gate direct tunneling current on circuit performance: A simulation study," IEEE Trans. Electron Devices, vol. 48, pp. 2823-2829, Dec., 2001.
    • (2001) IEEE Trans. Electron Devices , vol.48 , pp. 2823-2829
    • Choi, C.-H.1    Nam, K.-Y.2    Yu, Z.3    Dutton, R.W.4
  • 10
    • 0032284167 scopus 로고    scopus 로고
    • Remote charge scattering in MOSFET's with ultra-thin gate dielectrics
    • M. S. Krishnan, Y. C. Yeo, Q. Lu, T. King, J. Bokor, and C. Hu, "Remote charge scattering in MOSFET's with ultra-thin gate dielectrics," IEDM Tech. Dig., pp. 571-574, 1998.
    • (1998) IEDM Tech. Dig. , pp. 571-574
    • Krishnan, M.S.1    Yeo, Y.C.2    Lu, Q.3    King, T.4    Bokor, J.5    Hu, C.6
  • 11
    • 0033882265 scopus 로고    scopus 로고
    • Estimation of the effects of remote charge scattering on electron mobility of n-MOSFET's with ultrathin gate oxides
    • Feb.
    • N. Yang, W. K. Henson, J. R. Hauser, and J. J. Wortman, "Estimation of the effects of remote charge scattering on electron mobility of n-MOSFET's with ultrathin gate oxides," IEEE Trans. Electron Devices, vol. 47, pp. 440-446, Feb. 2000.
    • (2000) IEEE Trans. Electron Devices , vol.47 , pp. 440-446
    • Yang, N.1    Henson, W.K.2    Hauser, J.R.3    Wortman, J.J.4
  • 12
    • 0000805232 scopus 로고    scopus 로고
    • Long-range coulomb interactions in small Si devices. Part II: Effective electron mobility in thin-oxide structures
    • M. V. Fischetti, "Long-range coulomb interactions in small Si devices. Part II: Effective electron mobility in thin-oxide structures," J. Appl. Phys., vol. 89, no. 2, p. 1232, 2001.
    • (2001) J. Appl. Phys. , vol.89 , Issue.2 , pp. 1232
    • Fischetti, M.V.1
  • 13
    • 0032254714 scopus 로고    scopus 로고
    • Progress toward 10 nm CMOS devices
    • G. Timp et al., "Progress toward 10 nm CMOS devices," in IEDM Tech. Dig., 1998, pp. 615-618.
    • (1998) IEDM Tech. Dig. , pp. 615-618
    • Timp, G.1
  • 16
    • 34547827353 scopus 로고
    • Properties of semiconductor surface inversion layers in the electric quantum limit
    • F. Stern and W. E. Howard, "Properties of semiconductor surface inversion layers in the electric quantum limit," Phys. Rev., vol. 163, no. 3, pp. 816-835, 1967.
    • (1967) Phys. Rev. , vol.163 , Issue.3 , pp. 816-835
    • Stern, F.1    Howard, W.E.2
  • 17
    • 36749116064 scopus 로고
    • Impurity and phonon scattering in layered structures
    • K. Hess, "Impurity and phonon scattering in layered structures," Appl. Phys. Lett., vol. 35, no. 7, pp. 484-486, 1979.
    • (1979) Appl. Phys. Lett. , vol.35 , Issue.7 , pp. 484-486
    • Hess, K.1
  • 18
    • 0001582597 scopus 로고
    • xAs/GaAs single-well heterostructures
    • xAs/GaAs single-well heterostructures," Phys. Rev. B, vol. 33, no. 8, pp. 5595-5606, 1986.
    • (1986) Phys. Rev. B , vol.33 , Issue.8 , pp. 5595-5606
    • Yokoyama, K.1    Hess, K.2
  • 22
    • 35949025517 scopus 로고
    • The Monte Carlo method for the solution of charge transport in semiconductors with applications to covalent materials
    • C. Jacoboni and L. Reggiani, "The Monte Carlo method for the solution of charge transport in semiconductors with applications to covalent materials," Rev. Mod. Phys., vol. 55, pp. 645-705, 1983.
    • (1983) Rev. Mod. Phys. , vol.55 , pp. 645-705
    • Jacoboni, C.1    Reggiani, L.2
  • 24
    • 0042188119 scopus 로고
    • Effect of image charges on impurity scattering of two-dimensional electron gas in AlGaAs/GaAs
    • A. A. Grinberg and M. S. Shur, "Effect of image charges on impurity scattering of two-dimensional electron gas in AlGaAs/GaAs," J. Appl. Phys., vol. 58, no. 1, pp. 382-386, 1985.
    • (1985) J. Appl. Phys. , vol.58 , Issue.1 , pp. 382-386
    • Grinberg, A.A.1    Shur, M.S.2
  • 26
    • 0000858448 scopus 로고    scopus 로고
    • Polysilicon quantization effects on the electrical properties of MOS transistors
    • Dec.
    • A. S. Spinelli, A. Pacelli, and A. L. Lacaita, "Polysilicon quantization effects on the electrical properties of MOS transistors," IEEE Trans. Electron Devices, vol. 47, pp. 2366-2371, Dec. 2000.
    • (2000) IEEE Trans. Electron Devices , vol.47 , pp. 2366-2371
    • Spinelli, A.S.1    Pacelli, A.2    Lacaita, A.L.3
  • 27
    • 0001603407 scopus 로고
    • Theory of scattering in a nondegenerate-semiconductor-surface inversion layer by surface-oxide charges
    • T. H. King and C. T. Sah, "Theory of scattering in a nondegenerate-semiconductor-surface inversion layer by surface-oxide charges," Phys. Rev. B, vol. 6, no. 12, pp. 4605-4613, 1972.
    • (1972) Phys. Rev. B , vol.6 , Issue.12 , pp. 4605-4613
    • King, T.H.1    Sah, C.T.2
  • 28
    • 0042038779 scopus 로고
    • Effects of inhomogeneities of surface-oxide charges on the electron energy levels in a semiconductor surface-inversion layer
    • _, "Effects of inhomogeneities of surface-oxide charges on the electron energy levels in a semiconductor surface-inversion layer," Phys. Rev. B, vol. 9, no. 2, pp. 527-535, 1974.
    • (1974) Phys. Rev. B , vol.9 , Issue.2 , pp. 527-535
  • 30
    • 4243227379 scopus 로고
    • Monte Carlo study of electron transport in silicon inversion layers
    • M. V. Fischetti and S. E. Laux, "Monte Carlo study of electron transport in silicon inversion layers," Phys. Rev. B, vol. 48, pp. 2244-2274, 1993.
    • (1993) Phys. Rev. B , vol.48 , pp. 2244-2274
    • Fischetti, M.V.1    Laux, S.E.2
  • 31
    • 0642371109 scopus 로고
    • Screening effect and quantum transport in a silicon inversion layer in strong magnetic field
    • T. Ando, "Screening effect and quantum transport in a silicon inversion layer in strong magnetic field," J. Phys. Soc. Jpn, vol. 43, no. 5, pp. 1616-1626, 1977.
    • (1977) J. Phys. Soc. Jpn , vol.43 , Issue.5 , pp. 1616-1626
    • Ando, T.1
  • 32
    • 85032069152 scopus 로고
    • Electronic properties of two-dimensional systems
    • T. Ando, A. Fowler, and F. Stern, "Electronic properties of two-dimensional systems," Rev. Modern Phys., vol. 54, p. 437, 1982.
    • (1982) Rev. Modern Phys. , vol.54 , pp. 437
    • Ando, T.1    Fowler, A.2    Stern, F.3
  • 33
    • 0027692894 scopus 로고
    • Simulation of linear and nonlinear electron transport in homogeneous silicon inversion layers
    • C. Jungemann, A. Edmunds, and W. L. Engl, "Simulation of linear and nonlinear electron transport in homogeneous silicon inversion layers," Solid-State Electron., vol. 36, no. 11, pp. 1529-1540, 1993.
    • (1993) Solid-State Electron. , vol.36 , Issue.11 , pp. 1529-1540
    • Jungemann, C.1    Edmunds, A.2    Engl, W.L.3
  • 34
    • 0025575633 scopus 로고
    • Advanced electron mobility model of MOS inversion layer considering 2D-degenerated electron gas physics
    • Dec
    • M. Ishizaka, T. Iizuka, S. Ohi, M. Fukuma, and H. Mikoshiba, "Advanced electron mobility model of MOS inversion layer considering 2D-degenerated electron gas physics," in IEDM Tech. Dig., Dec 1990, pp. 763-766.
    • (1990) IEDM Tech. Dig. , pp. 763-766
    • Ishizaka, M.1    Iizuka, T.2    Ohi, S.3    Fukuma, M.4    Mikoshiba, H.5
  • 35
    • 0028747841 scopus 로고
    • On the universality of inversion-layer mobilty in Si MOSFET's. Part I- Effect of substrate impurity concentration
    • Dec.
    • S. Takagi, A. Toriumi, M. Iwase, and H. Tango, "On the universality of inversion-layer mobilty in Si MOSFET's. Part I- Effect of substrate impurity concentration," IEEE Trans. Electron Devices, vol. 41, pp. 2357-62, Dec. 1994.
    • (1994) IEEE Trans. Electron Devices , vol.41 , pp. 2357-2362
    • Takagi, S.1    Toriumi, A.2    Iwase, M.3    Tango, H.4
  • 36
    • 0022688857 scopus 로고
    • Inversion-layer capacitance and mobility of very thin gate-oxide MOSFET's
    • M. Liang, J. Y. Choi, P. Ko, and C. Hu, "Inversion-layer capacitance and mobility of very thin gate-oxide MOSFET's," IEEE Trans. Electron Devices, vol. ED-33, pp. 409-412, 1986.
    • (1986) IEEE Trans. Electron Devices , vol.ED-33 , pp. 409-412
    • Liang, M.1    Choi, J.Y.2    Ko, P.3    Hu, C.4
  • 37
    • 0035504954 scopus 로고    scopus 로고
    • Effective electron mobility in Si inversion layers in metal-oxide-semiconductor systems with a high-K insulator: The role of remote phonon scattering
    • M. V. Fischetti, D. A. Neumayer, and E. A. Cartier, "Effective electron mobility in Si inversion layers in metal-oxide-semiconductor systems with a high-K insulator: The role of remote phonon scattering," J. Appl. Phys., vol. 90, no. 9, pp. 4587-4608, 2001.
    • (2001) J. Appl. Phys. , vol.90 , Issue.9 , pp. 4587-4608
    • Fischetti, M.V.1    Neumayer, D.A.2    Cartier, E.A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.