Ultrathin oxides for the SCM analysis of sub-micron doping profiles

Materials Science and Engineering: B

Volumn 102, Issue 1-3, 2003, Pages 113-118

  Ciampolini, Lorenzo ^a   Bertin, F ^a   Hartmann, J M ^a   Rochat, N ^a   Holliger, Ph ^a   Laugier, F ^a   Chabli, A ^a  

^a CEA LETI   (France)

Author keywords

Dopant profiling techniques; SCM; Ultrathin oxides; UV ozone oxidation

Indexed keywords

ATTENUATION; CAPACITANCE; ELLIPSOMETRY; EPITAXIAL GROWTH; OXIDATION; SUBSTRATES;

ATTENUATED TOTAL REFLECTION (ATR);

ULSI CIRCUITS;

EID: 0043014546     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(03)00015-1     Document Type: Conference Paper

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