Direct measurement of Leff and channel profile in MOSFETs using 2-D carrier profiling techniques

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1998, Pages 559-562

  De Wolf, P ^a   Stephenson, R ^a   Biesemans, S ^a   Jansen, Ph ^a   Badenes, G ^a   De Meyer, K ^a   Vandervorst, W ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARRIER CONCENTRATION; CMOS INTEGRATED CIRCUITS; DIFFUSION IN SOLIDS; GATES (TRANSISTOR);

CARRIER PROFILING METHODS; SCANNING CAPACITANCE MICROSCOPY (SCM); SCANNING SPREADING RESISTANCE MICROSCOPY (SRRM); TRANSIENT ENHANCED DIFFUSION (TED) EFFECTS;

MOSFET DEVICES;

EID: 0032276828     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)