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Journal of the Electrochemical Society

Volumn 148, Issue 11, 2001, Pages

Cu Contamination Effect in Oxynitride Gate Dielectrics

(6) Lin, Y H a Pan, F M b Liao, Y C a Chen, Y C c Hsieh, I J c Chin, Albert a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

b NATIONAL NANO DEVICE LABORATORIES (Taiwan)

c CHUNG HUA UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041893264 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.1407834 Document Type: Article

Times cited : (11)

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