Thin oxides with in situ native oxide removal

IEEE Electron Device Letters

Volumn 18, Issue 9, 1997, Pages 417-419

  Chin, Albert ^a,b   Chen, W J ^c   Chang, T ^b   Kao, R H ^b   Lin, B C ^b   Tsai, C ^b   Huang, J C M ^d  

^a IEEE   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^c NATIONAL FORMOSA UNIVERSITY   (Taiwan)

^d INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; GATES (TRANSISTOR); INTERFACES (MATERIALS); OXIDATION; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

COULOMB SCATTERING; NATIVE OXIDE REMOVAL;

MOSFET DEVICES;

EID: 0031236704     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.622515     Document Type: Article

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