Transient-diffusion effects

Applied Physics A: Materials Science and Processing

Volumn 76, Issue 7, 2003, Pages 1041-1048

  Stiebel, D ^a   Pichler, P ^a  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DIFFUSION; TRANSIENTS;

TRANSIENT-DIFFUSION EFFECTS;

SEMICONDUCTOR DEVICES;

EID: 0038680602     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-002-1946-y     Document Type: Review

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