A reduced approach for modeling the influence of nanoclusters and {113} defects on transient enhanced diffusion

Applied Physics Letters

Volumn 79, Issue 16, 2001, Pages 2654-2656

  Stiebel, D ^a   Pichler, P ^a   Cowern, N E B ^b  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035886097     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1406147     Document Type: Article

References (8)

1. N. E. B. Cowern, J. F. F. Jos, K. T. F. Janssen, and A. J. H. Wachters, Mater. Res. Soc. Symp. Proc. 163, 605 (1990).
2. P. A. Stolk, H.-J. Gossmann, D. J. Eaglesham, D. C. Jacobson, C. S. Rafferty, G. H. Gilmer, M. Jaraiz, J. M. Poate, H. S. Luftman, and T. E. Haynes, J. Appl. Phys. 81, 6031 (1997).
3. N. E. B. Cowern, G. Mannino, P. A. Stolk, F. Roozeboom, H. G. A. Huizing, J. G. M. van Berkum, F. Cristiano, A. Claverie, and M. Jaraíz, Phys. Rev. Lett. 82, 4460 (1999).
4. C. S. Rafferty, G. H. Gilmer, M. Jaraiz, D. Eaglesham, and H.-J. Gossmann, Appl. Phys. Lett. 68, 2395 (1996).
5. A. H. Gencer and S. T. Dunham, Mater. Res. Soc. Symp. Proc. 532, 105 (1998).
6. G. Hobler and C. Rafferty, Mater. Res. Soc. Symp. Proc. 568, 123 (1999).
7. D. Stiebel, P. Pichler, and H. Ryssel, in Software for Electrical Engineering Analysis and Design, edited by A. Konrad, C. A. Brebbia (WIT Press, Southampton, 1999), p. 191.
8. P. Pichler, W. Juengling, S. Selberherr, E. Guerrero, and H. W. Pötzl, IEEE Trans. Comput.-Aided Des. CAD-4, 384 (1985).