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Volumn 69, Issue 10, 1996, Pages 1376-1378

Interactions of ion-implantation-induced interstitials with boron at high concentrations in silicon

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Indexed keywords


EID: 0001499236     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117441     Document Type: Article
Times cited : (82)

References (19)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.