Development of high-performance negative-tone resists for 193-nm lithography

Journal of Photopolymer Science and Technology

Volumn 16, Issue 4, 2003, Pages 489-498

  Hattori, Takashi ^a   Yokoyama, Yoshiyuki ^b   Kimura, Kaori ^a   Yamanaka, Ryoko ^a   Tanaka, Toshihiko ^a   Fukuda, Hiroshi ^a  

^a HITACHI LTD   (Japan)

^b TOYAMA INDUSTRIAL TECHNOLOGY CENTER   (Japan)

Author keywords

ArF phase shifting lithography; Hydroxy acid; Intramolecular esterification; Lactone; Negative tone resist

Indexed keywords

ACRYLIC ACID DERIVATIVE; ADAMANTANE LACTONE ACRYLATE; ALPHA ACRYLOYLOXY BETA,BETA DIMETHYL GAMMA BUTYROLACTONE; HYDROXYACID; LACTONE DERIVATIVE; NORBORNANE LACTONE ACRYLATE; UNCLASSIFIED DRUG;

ARTICLE; CARBON NUCLEAR MAGNETIC RESONANCE; CHEMICAL COMPOSITION; CHEMICAL REACTION; CHEMICAL STRUCTURE; ESTERIFICATION; HYDROLYSIS; LITHOGRAPHY; PROCESS TECHNOLOGY; PROTON NUCLEAR MAGNETIC RESONANCE; SURFACE PROPERTY;

EID: 0038168563     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.489     Document Type: Article

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