Structural design of new alicyclic acrylate polymer with androstane moiety for 193 nm resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 283-294

  Aoai, Toshiaki ^a   Sato, Kenichiro ^a   Kodama, Kunihiko ^a   Kawabe, Yasumasa ^a   Nakao, Hajime ^a   Yagihara, Morio ^a  

^a FUJIFILM CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLICS; ADHESION; DRY ETCHING; SUBSTRATES; SYNTHESIS (CHEMICAL);

ALICYCLIC METHACRYLATE POLYMERS; ANDROSTANE MOIETIES;

PHOTORESISTS;

EID: 0032662530     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (10)