Advanced materials for 193-nm resists

Journal of Photopolymer Science and Technology

Volumn 13, Issue 4, 2000, Pages 601-606

  Shida, Naomi ^a   Ushirogouchi, Tohru ^a   Asakawa, Koji ^a   Okino, Takeshi ^a   Saito, Satoshi ^a   Funaki, Yoshinori ^b   Takaragi, Akira ^b   Tsutsumi, Kiyoharu ^b   Inoue, Keizo ^b   Nakano, Tatsuya ^b  

^a Advanced Intelligent Systems   (Japan)

^b DAICEL CORPORATION   (Japan)

Author keywords

193 nm resist; Adamantane; Alicyclic; Lactone; Polar

Indexed keywords

ACID; ACRYLIC ACID; ADAMANTANE; ALICYCLIC COMPOUND; LACTONE; PYRAN DERIVATIVE;

ARTICLE; CATALYST; CHEMICAL REACTION; CHEMICAL STRUCTURE; HYDROPHILICITY; MATERIALS; OXIDATION; PERFORMANCE; POLARIZATION; POLYMERIZATION; SYNTHESIS; TECHNOLOGY;

EID: 0034584869     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.13.601     Document Type: Article

References (10)