Advanced materials for 193-nm resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999 (II), Issue , 2000, Pages 1147-1156

  Ushirogouchi, Tohru ^a   Asakawa, Koji ^a   Shida, Naomi ^a   Okino, Takeshi ^a   Saito, Satoshi ^a   Funaki, Yoshinori ^a   Takaragi, Akira ^a   Tsutsumi, Kiyoharu ^a   Nakano, Tatsuya ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLIC MONOMERS; CATALYSTS; COMPUTATIONAL METHODS; CORRELATION METHODS; MOLECULAR STRUCTURE; OXIDATION; POLYACRYLATES; POLYMERIZATION; SOLUBILITY; SYNTHESIS (CHEMICAL);

AEROBIC OXIDATION; HYDROPHILICITY; HYDROXYPHTALIMIDE;

PHOTORESISTS;

EID: 0033689550     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388279     Document Type: Conference Paper

References (16)