Optimization of exposure procedures for sub-quarter micron CMOS applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 598-606

  Hotta, Shoji ^a   Onozuka, Toshihiko ^a   Fukumoto, Keiko ^a   Shirai, Seiichiro ^a   Okazaki, Shinji ^a  

^a HITACHI LTD   (Japan)

Author keywords

CD variation; Defocus; Halftone phase shifting mask; Pattern pitch; Phase edge type phase shifting mask; Side lobe; Sub quarter micron gate

Indexed keywords

DATA STORAGE EQUIPMENT; KRYPTON; MASKS; MICROMETERS; OPTICAL RESOLVING POWER; PULSE MODULATION; THICKNESS MEASUREMENT;

CD VARIATION; DEFOCUS; HALFTONE PHASE-SHIFTING MASK; PATTERN PITCH; PHASE-EDGE TYPE PHASE-SHIFTING MASK; SIDE-LOBE; SUB-QUARTER MICRON GATE;

EDGE DETECTION;

EID: 0001435805     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310790     Document Type: Conference Paper

References (7)

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