Chemically amplified negative-tone resist using novel acryl polymer for 193 nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 676-683

  Hada, Hideo ^a   Iwai, Takeshi ^a   Nakayama, Toshimasa ^a  

^a TOKYO OHKA KOGYO CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSIS; CROSSLINKING; POLYACRYLATES; POLYESTERS;

CHEMICALLY AMPLIFIED NEGATIVE-TONE RESISTS;

PHOTORESISTS;

EID: 0032686468     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350254     Document Type: Conference Paper

References (11)