Chemically amplified negative resists based on alicyclic acrylate polymers for 193-nm lithography

Journal of Photopolymer Science and Technology

Volumn 12, Issue 3, 1999, Pages 487-492

  Iwasa, Shigeyuki ^a   Maeda, Katsumi ^a   Hasegawa, Etsuo ^a  

^a NEC CORPORATION   (Japan)

Author keywords

193 nm lithography; Alicyclic polymer; ArF excimer laser lithography; Chemically amplified resist; Epoxy group; Negative resist

Indexed keywords

EID: 0000140476     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.487     Document Type: Article

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