Negative-type chemically amplified resists for ArF excimer laser lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 503-511

  Naito, Takuya ^a   Takahashi, Makoto ^a   Ohfuji, Takeshi ^a   Sasago, Masaru ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Acrylic acid; Anhydride; ArF excimer laser; Chemically amplified resist; Epoxide; Negative type

Indexed keywords

CARBOXYLIC ACIDS; EXCIMER LASERS; GAS LASERS; ORGANIC ACIDS; PHOTORESISTORS; THICKNESS MEASUREMENT;

ACRYLIC ACID; ANHYDRIDE; ARF EXCIMER LASER; CHEMICALLY AMPLIFIED RESIST; EPOXIDE; NEGATIVE TYPE;

PHOTORESISTS;

EID: 0000675972     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312364     Document Type: Conference Paper

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