Micro-swelling-free negative resists for ArF excimer laser lithography utilizing acid-catalyzed intramolecular esterification

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 411-419

  Hattori, Takashi ^a   Tsuchiya, Yuko ^a   Yokoyama, Yoshiyuki ^a   Oizumi, Hiroaki ^a   Morisawa, Taku ^a   Yamaguchi, Atsuko ^a   Shiraishi, Hiroshi ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ESTERIFICATION; EXCIMER LASERS; HYDROXYLATION;

ACID-CATALYZED INTRAMOLECULAR ESTERIFICATION; LACTONE STRUCTURE; MICRO-SWELLING-FREE NEGATIVE RESISTS; PHOTOACIDS;

PHOTORESISTS;

EID: 0032671544     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350223     Document Type: Conference Paper

References (19)