Suppression of pattern edge roughness by low ion strength developer

Journal of Photopolymer Science and Technology

Volumn 14, Issue 4, 2001, Pages 519-522

  Kumada, Teruhiko ^a   Sumitani, Hiroaki ^a   Matsui, Yasuji ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Critical dimension; Developer; Esist; Ion strength; SR lithography

Indexed keywords

POLYMER;

ARTICLE; FILM; IONIC STRENGTH; LITHOGRAPHY; MEASUREMENT; MODEL; SYNCHROTRON; SYNCHROTRON RADIATION LITHOGRAPHY; TECHNOLOGY; THICKNESS;

EID: 0035746849     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.519     Document Type: Article

References (7)