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Chemical Vapor Deposition

Volumn 5, Issue 5, 1999, Pages 233-236

Metal-organic chemical vapor deposition of La2CuO4+x thin films with gas phase composition control

(5) DeSisto, William J a Cukauskas, Edward J a Rappoli, Brian J a Culbertson, James C a Claassen, John H a

a NAVAL RESEARCH LABORATORY (United States)

Author keywords

Composition control; MOCVD; Superconductor

Indexed keywords

EID: 0001075283 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/(sici)1521-3862(199910)5:5<233::aid-cvde233>3.3.co;2-0 Document Type: Article

Times cited : (6)

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