Integrated dynamic simulation of rapid thermal chemical vapor deposition of polysilicon

IEEE Transactions on Semiconductor Manufacturing

Volumn 11, Issue 1, 1998, Pages 63-74

  Lu, Guangquan ^b   Bora, Monalisa ^c   Tedder, Laura L ^d   Rubloff, Gary W ^a,e  

^a IEEE   (United States)

^b NOVELLUS SYSTEMS INC   (United States)

^c Actel Corp   (United States)

^d UNIVERSITY OF COLORADO   (United States)

^e UNIVERSITY OF MARYLAND   (United States)

Author keywords

CVD; Semiconductor process modeling; Simulation

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; CONTROL SYSTEM ANALYSIS; HEAT TRANSFER; MASS TRANSFER; MATHEMATICAL MODELS; OPTIMIZATION; PROCESS CONTROL; REACTION KINETICS; SILICON WAFERS;

POLYSILICON; RAPID THERMAL CHEMICAL VAPOR DEPOSITION; REDUCED ORDER MODEL;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031996612     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.661286     Document Type: Article

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