Measurement and control of reagent concentrations in MOCVD reactor using ultrasonics

Journal of Crystal Growth

Volumn 120, Issue 1-4, 1992, Pages 98-102

  Stagg, J P ^a   Christer, J ^b   Thrush, E J ^a   Crawley, J ^b  

^a NORTEL NETWORKS   (Canada)

^b THOMAS SWAN AND CO LTD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ORGANOMETALLICS; PROCESS CONTROL--COMPUTER APPLICATIONS; PROCESS CONTROL--ULTRASONIC APPLICATIONS; SEMICONDUCTING INDIUM COMPOUNDS--GROWTH;

TRIMETHYLINDIUM;

CHEMICAL REACTORS;

EID: 0027108780     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-0248(92)90371-O     Document Type: Article

References (7)