Tuning MEEF for CD control at 65nm node based on Chromeless Phase Lithography (CPL™)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 579-591

  Van Den Broeke, Doug ^a   Laidig, Tom ^a   Wampler, Kurt E ^a   Hsu, Stephen ^a   Shi, Xuelong ^a   Hsu, Michael ^a   Burchard, Paul ^a   Chen, J Fung ^a  

^a ASML US Inc   (United States)

Author keywords

Chromeless mask; Chromeless Phase Lithography; CPL; High Transmission Attenuated PSM; Mask bias factor; Mask error enhancement factor; Mask error factor; MBF; MEEF; MEF; PSM

Indexed keywords

COMPUTER SOFTWARE; DATA REDUCTION; LITHOGRAPHY; PHASE SHIFT; SEMICONDUCTOR DEVICE MANUFACTURE;

WAFER IMAGING;

MASKS;

EID: 0037965966     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467508     Document Type: Conference Paper

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