Extending KrF to 100 nm imaging with high-NA and chromeless phase lithography technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691, Issue 1, 2002, Pages 446-458

  Socha, Robert ^a   Van Den Broeke, Doug ^a   Yu, Linda ^a   Conley, Will ^b   Wu, Wei ^b   Chen, Fung ^a   Petersen, John ^c   Gerold, Dave ^c   Van Praagh, Judith ^d   Droste, Richard ^a   Flagello, Donis ^a   Hsu, Stephen ^a  

^a ASML US Inc   (United States)

^b MOTOROLA INC   (United States)

^c Petersen Advanced Lithography   (United States)

^d ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DYNAMIC RANDOM ACCESS STORAGE; IMAGING SYSTEMS; LOGIC GATES; PHASE SHIFT; STATIC RANDOM ACCESS STORAGE;

CHROMELESS PHASE LITHOGRAPHY (CPL);

PHOTOLITHOGRAPHY;

EID: 18644380657     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474594     Document Type: Article

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