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Volumn 3748, Issue , 1999, Pages 273-276
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Mask manufacturability issues for sub-wavelength lithography
a
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Author keywords
[No Author keywords available]
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Indexed keywords
CONSTRAINT THEORY;
ERROR ANALYSIS;
IMAGE ANALYSIS;
IMAGE QUALITY;
PHASE SHIFT;
PHOTOLITHOGRAPHY;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DEVICE MANUFACTURE;
MASK ERROR ATTENUATION FACTOR (MEAF);
MASK ERROR ENHANCEMENT FACTOR (MEEF);
OPTICAL PROXIMITY CORRECTION (OPC);
PHASE SHIFTING MASKS (PSM);
MASKS;
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EID: 0032681522
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.360256 Document Type: Conference Paper |
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Times cited : (5)
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References (6)
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