Resolution capability and the mask error enhancement function (MEEF) for ArF and KrF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 851-857

  Plat, Marina ^a   Spence, Christopher ^a   Lyons, Christopher ^a   Wilkison, Amada ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; IMAGE ENHANCEMENT; KRYPTON; LIGHTING; MASKS; OPTICAL DESIGN; OPTICAL RESOLVING POWER; PRINTING; SCANNING;

MASK ERROR ENHANCEMENT FUNCTIONS (MEEF); OPTICAL PROXIMITY CORRECTIONS;

PHOTORESISTS;

EID: 0035758842     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435785     Document Type: Conference Paper

References (7)

1. "Pattern Collapse in High Aspect Ratio DUV- and 193nm Resists" Wolf D. Domke, Victoria L. Graffenberg, Shashikant Patel, Georgia K. Rich, Heidi B. Cao, Paul F. Nealey, SPIE-2000, advancement in the resist technology, #3999, PP 313-321.
2. "The effect of MEEF on process window capability." D.Schurz, W.Flack, S. Cohen, T.Nweman, K.Nguyen Bacus, 1999 #3873-p.22.
3. "The impact of mask error on optical lithography" C.Mack, 1999 interface '99 proceedings, pp. 75.
4. The impact of Optical Enhancement Techniques on the Mask Error Enhancement Function (MEEF), Marina Plat, Chris Spence, Chris Lyons and Amada Wilkison, Proceedings from 2000, SPIE, Optical Lithography XII, p206.
5. "Can Phase Shift save the Semiconductor industry" M.Levinson, 1998, proceedings from Interface'98, pp. 165.
6. "Mask Error Factor: Causes and Implications for process latitude" Jan Van Schoot, Jo Finders et.al, Proceedings from 1999, SPIE, Optical Lithography XII, PP25.
7. "Reduction of Mask induced CD Errors by optical proximity correction" A.Tritchkov, r. Jonckheere, p. Jaenen, K. Ronse. Proceedings from 1998, SPIE, Optical Lithography XI, p125.