Patterning half-wavelength DRAM cell using chromeless phase lithography (CPL)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691, Issue 1, 2002, Pages 76-88

  Hsu, Chungwei ^a   Chu, Ron ^b   Fung Chen, J ^a   Van Den Broeke, Doug ^a   Shi, Xuelong ^a   Hsu, Stephen ^a   Wang, Troy ^b  

^a ASML US Inc   (United States)

^b NANYA TECHNOLOGY CORPORATION   (Taiwan)

Author keywords

Chromeless Phase Lithography (CPL); Chromeless PSM (CLM); Off axis illumination (OAI); Optical proximity correction (OPC); Phase shifting mask (PSM); Resolution enhancement techniques (RET)

Indexed keywords

COMPUTER SIMULATION; DYNAMIC RANDOM ACCESS STORAGE; IMAGING TECHNIQUES; MASKS; OPTICAL RESOLVING POWER; PHASE SHIFT;

CHROMELESS PHASE LITHOGRAPHY (CPL);

PHOTORESISTS;

EID: 0036415722     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474629     Document Type: Article

References (8)

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