Development of a sub-100 nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 I, Issue , 2002, Pages 515-529

  Petersen, John S ^a   Conley, Will ^b   Roman, Bernie ^b   Litt, Lloyd ^b   Lucas, Kevin ^b   Wu, Wei ^b   Van Den Broeke, Doug ^c   Chen, J Fung ^c   Laidig, Tom ^c   Wampler, Kurt ^c   Gerold, David J ^a   Socha, Robert ^c   Van Praagh, Judith ^d   Droste, Richard ^d  

^a Petersen Advanced Lithography   (United States)

^b MOTOROLA INC   (United States)

^c ASML US Inc   (United States)

^d ASML   (Netherlands)

Author keywords

Chromeless PSM; CLM; Halftone; High NA; Integrated Imaging System; Mask fabrication; OAI; Off axis illumination; OPC; PSM

Indexed keywords

COMPUTER SIMULATION; ELECTROMAGNETIC WAVE DIFFRACTION; IMAGING TECHNIQUES; LIGHT TRANSMISSION; MASKS; OPTICAL RECORDING; PHOTORESISTS;

CHROMELESS PHASE-SHIFT LITHOGRAPHY (CPL);

PHASE SHIFT;

EID: 0141541460     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474599     Document Type: Article

References (7)

1. Socha et al., SPIE 3748, pp. 290-314 (1999).
2. Petersen et al., SPIE 3546, pp. 288-303 (1998).
3. M.D. Levenson, Physics Today, pp. 28-36 (July 1993).
4. C.A. Mack, KTI Microlithography Seminar: Interface'91, pp. 23-35 (1991).
5. T.A. Brunner, SPIE 1927, pp. 54-62 (1993).
6. J.F. Chen et al., SPIE 4346, pp. 515-533 (2001). (Note that this paper has an excellent bibliography concerning chromeless phase shift).
7. US Patent 6,335, 130.