Practical technology path to sub-0.10 micron process generations via enhanced optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue , 1999, Pages

  Chen, J Fung ^a   Laidig, Tom ^a   Wampler, Kurt E ^a   Caldwell, Roger ^a   Nakagawa, Kent H ^a   Liebchen, Armin ^a  

^a ASML US Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOLITHOGRAPHY; TECHNOLOGY TRANSFER;

OPTICAL PROXIMITY CORRECTION (OPC); PHASE SHIFTING MASKS (PSM);

MASKS;

EID: 0033335459     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (20)