Impact of mask errors on full chip error budgets

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue I, 1999, Pages 261-275

  Schellenberg, F M ^a   Boksha, Victor ^a   Cobb, Nick ^a   Lai, J C ^a   Chen, C H ^a   Mack, Chris ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ERROR ANALYSIS; INTEGRATED CIRCUIT LAYOUT; MASKS; MATHEMATICAL MODELS;

ACROSS CHIP LINEWIDTH VARIATION (ACLV); MASK ERROR FACTORS (MEF); OPTICAL PROXIMITY CORRECTION (OPC);

PHOTOLITHOGRAPHY;

EID: 0032632951     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354339     Document Type: Conference Paper

References (14)