Simulation of steady state leakage current in thin films

Materials Research Society Symposium - Proceedings

Volumn 748, Issue , 2003, Pages 199-204

  Schroeder, Herbert ^a   Schmitz, Sam ^a   Meuffels, Paul ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; CAPACITORS; COMPUTER SIMULATION; DIFFUSION; ELECTRODES; FERROELECTRIC MATERIALS; INTERFACES (MATERIALS); LEAKAGE CURRENTS; PERMITTIVITY; STRONTIUM COMPOUNDS;

INJECTION-DIFFUSION MODELS;

THIN FILMS;

EID: 0037699303     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (20)

1. G.W. Dietz et al., J. Appl. Phys. 82, 2359 (1997).
2. J.D. Baniecki et al., J. European Ceramic Soc. 19, 1457 (1999).
3. C. Zhou and D.W. Newns, J. Appl. Phys. 82, 3081 (1997).
4. K. Natori, D. Otani, and N. Sano, Appl. Phys. Letters 73, 632 (1998).
5. C. Basceri, S.K. Streiffer, A.I. Kingon and R. Waser, J. Appl. Phys. 82, 2497 (1997).
6. U. Ellerkmann, R. Liedtke, and R. Waser, Ferroelectrics 271, 315 (2002).
7. C.S. Hwang, J. Appl. Phys. 92, 432 (2002).
8. C.T. Black and J.J. Welser, IEEE Trans. Electron Devices 46, 776 (1999).
9. M. Dawber and J.F. Scott, Jpn. J. Appl. Phys. 41, 6848 (2002).
10. D.E. Kotecki et al., IBM J. Res. Develop. 43, 367 (1999).
11. H. Schroeder, S. Schmitz, and P. Meuffels, Appl. Phys. Letters 82, 781 (2003).
12. C.R. Crowell and S.M. Sze, Solid-State Electronics 9, 1035 (1966). See also: S.M. Sze, Physics of Semiconductor Devices, (2nd Ed., John Wiley & Sons, New York, 1981).
13. C.R. Crowell and S.M. Sze, Solid-State Electronics 9, 1035 (1966). See also: S.M. Sze, Physics of Semiconductor Devices, (2nd Ed., John Wiley & Sons, New York, 1981).
14. T.R. Brumleve and R.P. Buck, J. Electroanal. Chem. 90, 1 (1978).
15. S. Schmitz, Thesis RWTH Aachen, 2002.
16. H. Schroeder and S.Schmitz, unpublished.
17. J.C. Shin, J. Park, C.S. Hwang, and H.J. Kim, J. Appl. Phys. 86, 506 (1999).
18. F. Fitsilis et al., Integr. Ferroel. 38, 211 (2001).
19. Y. Takeshima, K. Tanaka, and Y. Sakabe, Jpn. J. Apll. Phys. 39, 5389 (2000).
20. H. Schroeder and S. Schmitz, "Leakage current measurements in STO and BST thin films", this volume