Structure property relations of BST thin films

Integrated Ferroelectrics

Volumn 38, Issue 1-4, 2001, Pages 211-220

  Fitsilis, F ^a   Regnery, S ^a,b   Ehrhart, P ^a   Waser, R ^a   Schienle, F ^b   Schumacher, M ^b   Juergensen, H ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b AIXTRON AG   (Germany)

Author keywords

(Ba,Sr)TiO3; Conformal deposition; Leakage current; Liquid delivery; MOCVD; Multi wafer reactor

Indexed keywords

CRYSTAL ORIENTATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PARAMETER ESTIMATION; RANDOM PROCESSES; SILICON WAFERS; SOLID SOLUTIONS;

CONFORMAL DEPOSITION; LIQUID DELIVERY; LIQUID DELIVERY SYSTEMS; MULTI-WAFER REACTORS;

THIN FILMS;

EID: 0013226172     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580108016934     Document Type: Article

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