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Volumn 2, Issue 2, 2002, Pages 131-135

Self-Assembled Masks for the Transfer of Nanometer-Scale Patterns into Surfaces: Characterization by AFM and LFM

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0037655226     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl015639v     Document Type: Article
Times cited : (35)

References (45)
  • 28
    • 0346285394 scopus 로고    scopus 로고
    • Silicon substrates were cleaned by soaking for 5 min in boiling chloroform (Fisher Scientific, Canada, HPLC Grade)/ethanol (Anhydrous, Commercial Alcohols Inc., Canada) (50:50 v/v) solution, followed by ultrasonication for 2 min.
    • Silicon substrates were cleaned by soaking for 5 min in boiling chloroform (Fisher Scientific, Canada, HPLC Grade)/ethanol (Anhydrous, Commercial Alcohols Inc., Canada) (50:50 v/v) solution, followed by ultrasonication for 2 min.
  • 30
    • 0346915443 scopus 로고    scopus 로고
    • note
    • 31 have reported similar humidity effects on the LFM experiment when performed in air.
  • 42
    • 0346285393 scopus 로고    scopus 로고
    • note
    • 2 and Au layers (114 and 200 nm respectively) had not been milled through.
  • 43
    • 0346915440 scopus 로고    scopus 로고
    • note
    • -6 Torr. The Au surface was fixed to a glass slide with epoxy glue, and then pulled off the Si wafer, thus exposing a smooth surface of Au. This method is a variation of that described by Stamou et al. (ref 44).
  • 45
    • 0348176051 scopus 로고    scopus 로고
    • note
    • 2 or Au samples under the experimental conditions explored. Furthermore, UV/ozone cleaned and oxide-sharpened AFM tips are required to resolve these edge effects.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.