Spontaneous production of 10-nm Si structures by plasma etching using self-formed masks

Applied Physics Letters

Volumn 70, Issue 19, 1997, Pages 2538-2540

  Tada, Tetsuya ^a,b   Hamoudi, Ali ^a   Kanayama, Toshihiko ^a,b   Koga, Kenji ^a  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000711641     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118913     Document Type: Article

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