Kinetically Controlled Chemical Sensing Using Micromachined Structures

Accounts of Chemical Research

Volumn 31, Issue 5, 1998, Pages 279-287

  Semancik, Steve ^a,b,c   Cavicchi, Richard ^a,d,e,f  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^c BROWN UNIVERSITY   (United States)

^d MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^e Department of Obstetrics Gynecology   (United States)

^f LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001025179     PISSN: 00014842     EISSN: None     Source Type: Journal    
DOI: 10.1021/ar970071b     Document Type: Article

References (23)

1. Bryzek, J.; Petersen, K.; McCulley, W. IEEE Spectrum 1994 (May), 20-31.
2. Middelhoek, S.; Bellekom, A. A.; Dauderstadt, U.; French, P. J. Meas. Sci. Technol 1995, 6, 1641.
3. See, for example: Madou, M. J.; Morrison, S. R. Chemical Sensing with Solid State Devices; Academic Press: San Diego, CA, 1989.
4. Semancik, S.; Cavicchi, R. E. Appl. Surf. Sci. 1993, 70/71, 337-346.
5. Yamazoe, N.; Fuchigami, T.; Kishitawa, M.; Seiyama, T. Surf. Sci. 1979, 86, 335.
6. Lang, W. Mater. Sci. Eng., R 1996, R17 (1), 1-55.
7. Madou, M. J. Fundamentals of Microfabrication; CRC Press: Boca Raton, FL, 1997.
8. Baltes, H.; Paul, O.; Korvink, J. G.; Schneider, M.; Buhler, J.; Schneeberger, N.; Jaeggi, D.; Malcovati, P.; Hornung, M.; Hiberli, A.; v. Arx, M.; Mayer, E.; Funk, J. In International Electron Devices Meeting. Technical Digest; IEEE: New York-San Francisco, 1997; p 521.
9. Taguchi sensors are manufactured by Figaro, Inc. This commercial device is mentioned here as an example and to provide historical background for the reader. Its mention in no way implies recommendation or endorsement by the National Institute of Standards and Technology.
10. Cox, D. F.; Fryberger, T. B.; Semancik, S. Phys. Rev. 1988, B38, 2072-2083.
11. Nakata, S.; Akakabe, S.; Nakasuji, M.; Yoshikawa, K. Anal. Chem. 1996, 68, 2067.
12. Semancik, S.; Cavicchi, R. E.; Gaitan, M.; Suehle, J. S. U. S. Patent 5,345,213, 1994.
13. MOSIS (Metal Oxide Semiconductor Implementation Service). This vendor is identified only to specify experimental procedure. Its mention in no way implies recommendation or endorsement by the National Institute of Standards and Technology.
14. MRL (Microelectronics Research Laboratory of the Department of Defense, Columbia, MD). This supplier is identified only to specify experimental procedure. Its mention in no way implies recommendation or endorsement by the National Institute of Standards and Technology.
15. Suehle, J. S.; Cavicchi, R. E.; Gaitan, M.; Semancik, S. IEEE Electron Device Lett. 1993, 14, 118-120.
16. Semancik, S.; Cavicchi, R. E.; Kreider, K. G.; Suehle, J. S.; Chaparala, P. Sens. Actuators 1996, B34, 209-212.
17. Cavicchi, R. E.; Suehle, J. S.; Kreider, K. G.; Shomaker, B.; Small, J. A.; Gaitan, M.; Chaparala, P. Appl. Phys. Lett. 1995, 66, 812-814.
18. Cavicchi, R. E.; Suehle, J. S.; Kreider, K. G.; Gaitan, M.; Chaparala, P. IEEE Electron Device Lett. 1995, 16, 286-288.
19. Cavicchi, R. E.; Semancik, S.; Suehle, J. S.; Gaitan, M. U.S. Patent 5,356,756, 1994.
20. Yamazoe, N.; Miura, N. Chem. Sens. Technol. 1992, 4, 19-42.
21. Poirier, G. E.; Cavicchi, R. E.; Semancik, S. J. Vac. Sci. Technol. 1993, A11, 1392-1395.
22. Ratton, L.; Kunt, T.; McAvoy, T.; Fuja, T.; Cavicchi, R.; Semancik, S. Sens. Actuators 1997, B41, 105-120.
23. Kunt, T.; McAvoy, T. J.; Cavicchi, R. E.; Semancik, S. Proc. ADCHEM '97 1997, 91-95.