Coalescence and overgrowth of diamond grains for improved heteroepitaxy on silicon (001)

Journal of Applied Physics

Volumn 83, Issue 5, 1998, Pages 2511-2518

  Jiang, X ^a   Schiffmann, K ^a   Klages, C P ^a   Wittorf, D ^b   Jia, C L ^b   Urban, K ^b   Jager W ^c  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

^c UNIVERSITY OF KIEL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001766379     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367012     Document Type: Article

References (23)

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