Influence of the target-substrate distance on the properties of indium tin oxide films prepared by radio frequency reactive magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 II, 2000, Pages 1668-1671

  Meng, Li Jian ^a   Dos Santos, M P ^b  

^a INSTITUTO SUPERIOR DE ENGENHARIA DO PORTO   (Portugal)

^b UNIVERSITY OF MINHO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; ELECTRIC CONDUCTIVITY OF SOLIDS; GLASS; MAGNETRON SPUTTERING; MOLECULAR ORIENTATION; SEMICONDUCTING INDIUM COMPOUNDS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

INDIUM TIN OXIDE; RADIO FREQUENCY REACTIVE MAGNETRON SPUTTERING;

SEMICONDUCTING FILMS;

EID: 0034227044     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582404     Document Type: Article

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