Characteristics of zirconium-silicate films prepared by using different co-sputtering methods

Journal of the Korean Physical Society

Volumn 42, Issue 2, 2003, Pages 267-271

  Jeon, Changbae ^a   Kong, Seongho ^a   Kim, Jiyoung ^a  

^a Kookmin University   (South Korea)

Author keywords

Alternative gate dielectrics; Scale down; Zr silicate

Indexed keywords

EID: 0037296713     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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