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Advanced Materials
Volumn 14, Issue 17, 2002, Pages 199-204+1184
Atomic layer deposition of hafnium dioxide films from hafnium tetrakis(ethylmethylamide) and water
(5)
Kukli, Kaupo
a
Ritala, Mikko
a
Sajavaara, Timo
a
Keinonen, Juhani
a
Leskelä, Markku
a
a
UNIVERSITY OF HELSINKI
(
Finland
)
Author keywords
Atomic layer deposition; Dielectrics; Hafnium dioxide; Ion beam analysis
Indexed keywords
ADSORPTION; CRYSTALLIZATION; DIELECTRIC MATERIALS; FILM GROWTH; HAFNIUM COMPOUNDS; STOICHIOMETRY; THIN FILMS; WATER;
ATOMIC LAYER DEPOSITION (ALD);
DEPOSITION;
EID
:
0037015250
PISSN
:
09359648
EISSN
:
None
Source Type
:
Journal
DOI
:
None
Document Type
:
Article
Times cited : (
1
)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.
