Outlook on new transistor materials

Semiconductor International

Volumn 24, Issue 12, 2001, Pages 61-66

  Peters, Laura ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; DIELECTRIC MATERIALS; DYNAMIC RANDOM ACCESS STORAGE; MICROELECTROMECHANICAL DEVICES; POLYSILICON; SEMICONDUCTOR DOPING; SILICA; SUBSTRATES;

TRANSISTOR MATERIALS;

MOSFET DEVICES;

EID: 0035474920     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (2)

1. R. Wallace, G. Wilk, "Exploring the Limits of Gate Dielectric Scaling," Semiconductor International, June 2001, p. 153.
2. R. Wallace, G. Wilk, "Identifying the Most Promising High-k Gate Dielectrics," Semiconductor International, July 2001, p. 227.