Tunable optical filter of porous silicon as key component for a MEMS spectrometer

Journal of Microelectromechanical Systems

Volumn 11, Issue 6, 2002, Pages 815-828

  Lammel, Gerhard ^a   Schweizer, Sandra ^b   Schiesser, Sébastien ^c   Renaud, Philippe ^c  

^a ROBERT BOSCH GMBH   (Germany)

^b PALO ALTO RESEARCH CENTER   (United States)

^c EPFL   (Switzerland)

Author keywords

Electropolishing; Gas sensing; Infrared; Microspectrometer; Porous silicon; Surface micromachining; Tunable optical filter

Indexed keywords

ELECTROLYTIC POLISHING; INFRARED SPECTROSCOPY; MICROMACHINING; OPTICAL FILTERS; PHOTOLITHOGRAPHY; POROSITY; REFRACTIVE INDEX; SPECTROMETERS;

PIXEL DETECTORS;

MICROELECTROMECHANICAL DEVICES;

EID: 0036902641     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2002.803278     Document Type: Article

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