Porous silicon as a sacrificial material

Journal of Micromechanics and Microengineering

Volumn 6, Issue 4, 1996, Pages 361-369

  Bell, T E ^a   Gennissen, P T J ^b   Demunter, D ^b   Kuhl, M ^c  

^a University of Michigan   (United States)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; ETCHING; MICROELECTROMECHANICAL DEVICES; MICROELECTRONIC PROCESSING; MICROMACHINING; OXIDES; SEMICONDUCTOR DOPING; SENSORS;

HYDROXIDE SOLUTION; MICRONS; SACRIFICIAL MATERIAL; SELECTIVE DOPING; SINGLE CRYSTAL SILICON;

POROUS SILICON;

EID: 0030352683     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/6/4/002     Document Type: Article

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