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Volumn 10, Issue 1, 2000, Pages 93-99

Rib-reinforced micromachined beam and its applications

Author keywords

[No Author keywords available]

Indexed keywords

BENDING STRENGTH; CANTILEVER BEAMS; STIFFNESS; THIN FILMS;

EID: 0033893264     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/10/1/313     Document Type: Article
Times cited : (19)

References (15)
  • 1
    • 0030230992 scopus 로고    scopus 로고
    • Determining mean and gradient residual stress in thin-films using micromachined cantilevers
    • Fang W and Wickert J A 1996 Determining mean and gradient residual stress in thin-films using micromachined cantilevers J. Micromech. Microeng. 6 301-9
    • (1996) J. Micromech. Microeng. , vol.6 , pp. 301-309
    • Fang, W.1    Wickert, J.A.2
  • 3
    • 0032293020 scopus 로고    scopus 로고
    • Fabrication of micro torsional actuator using surface plus bulk micromachining processes
    • Hsieh J and Fang W 1998 Fabrication of micro torsional actuator using surface plus bulk micromachining processes SPIE Micromachining Microfabrication 3514 368-76
    • (1998) SPIE Micromachining Microfabrication , vol.3514 , pp. 368-376
    • Hsieh, J.1    Fang, W.2
  • 5
    • 0022046041 scopus 로고
    • Influence of deposition temperature, gas pressure, gas phase composition, and RF frequency on composition and mechanical stress of plasma silicon nitride layers
    • Claassen W A P, Valkenburg W G J N, Willemsen M F C and van de Wijgert W M 1985 Influence of deposition temperature, gas pressure, gas phase composition, and RF frequency on composition and mechanical stress of plasma silicon nitride layers J. Electrochem. Soc. 132 893-8
    • (1985) J. Electrochem. Soc. , vol.132 , pp. 893-898
    • Claassen, W.A.P.1    Valkenburg, W.G.J.N.2    Willemsen, M.F.C.3    Van De Wijgert, W.M.4
  • 6
    • 0031647456 scopus 로고    scopus 로고
    • Residual-stress relaxation in polysilicon thin-films by high-temperature rapid thermal annealing
    • Zhang X, Zhang T Y, Wong M and Zohar Y 1998 Residual-stress relaxation in polysilicon thin-films by high-temperature rapid thermal annealing Sensors Actuators A 64 109-15
    • (1998) Sensors Actuators A , vol.64 , pp. 109-115
    • Zhang, X.1    Zhang, T.Y.2    Wong, M.3    Zohar, Y.4
  • 8
    • 0031333120 scopus 로고    scopus 로고
    • Fabrication of low-stress dielectric thin-film for microsensor applications
    • Chou B C S, Shie J-S and Chen C-N 1997 Fabrication of low-stress dielectric thin-film for microsensor applications IEEE Electron Device Lett. 18 599-601
    • (1997) IEEE Electron Device Lett. , vol.18 , pp. 599-601
    • Chou, B.C.S.1    Shie, J.-S.2    Chen, C.-N.3
  • 10
    • 0026257716 scopus 로고
    • A miniature Fabry-Perot interferometer with a corrugated silicon diaphragms support
    • Jerman J H, Clift D J and Mallinson S R 1991 A miniature Fabry-Perot interferometer with a corrugated silicon diaphragms support Sensors Actuators A 29 151-8
    • (1991) Sensors Actuators A , vol.29 , pp. 151-158
    • Jerman, J.H.1    Clift, D.J.2    Mallinson, S.R.3
  • 12
    • 0032298938 scopus 로고    scopus 로고
    • High brightness projection display system based on the thin-film actuated mirror array (TFAMA)
    • Hwang K-H, Koo W-K and Kim S-G 1998 High brightness projection display system based on the thin-film actuated mirror array (TFAMA) SPIE Micromachining Microfabrication 3513 171-80
    • (1998) SPIE Micromachining Microfabrication , vol.3513 , pp. 171-180
    • Hwang, K.-H.1    Koo, W.-K.2    Kim, S.-G.3
  • 13
    • 0030233744 scopus 로고    scopus 로고
    • SCREAM microelectromechanical systems
    • MacDonald N C 1996 SCREAM microelectromechanical systems Microelectron. Eng. 32 49-73
    • (1996) Microelectron. Eng. , vol.32 , pp. 49-73
    • MacDonald, N.C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.