Evaluation of thermal conductivity of porous silicon layers by a photoacoustic method

Applied Physics A: Materials Science and Processing

Volumn 64, Issue 2, 1997, Pages 155-159

  Benedetto, G ^a   Boarino, L ^a   Spagnolo, R ^a  

^a ISTITUTO ELETTROTECNICO NAZIONALE GALILEO FERRARIS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; ETCHING; MATHEMATICAL MODELS; PHOTOACOUSTIC EFFECT; POROUS MATERIALS; SILICON WAFERS; THERMAL CONDUCTIVITY OF SOLIDS;

CRYSTALLINE WAFERS; PHOTOACOUSTIC GAS MICROPHONE TECHNIQUE; POROUS SILICON LAYERS;

SEMICONDUCTING SILICON;

EID: 0031069132     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390050457     Document Type: Review

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