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Advanced Metallization Conference (AMC)

Volumn , Issue , 2001, Pages 279-285

Evaluation of Ta(N) diffusion barrier integrity on porous low-k films

(5) Shamiryan, D a Baklanov, M R a Tokei Z a Iacopi, F a Maex, K a

a IMEC (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; DIFFUSION IN SOLIDS; ELLIPSOMETRY; PORE SIZE; POROSIMETERS; POROSITY; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES; TANTALUM COMPOUNDS;

DIFFUSION BARRIERS; ELLIPSOMETRIC POROSIMETRY (EP);

DIELECTRIC FILMS;

EID: 0035555183 PISSN: 10480854 EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper

Times cited : (14)

References (11)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.