Determination of pore size distribution and surface area of thin porous silicon layers by spectroscopic ellipsometry

Applied Surface Science

Volumn 172, Issue 1-2, 2001, Pages 117-125

  Wongmanerod, C ^a   Zangooie, S ^b   Arwin, H ^c  

^a CHULALONGKORN UNIVERSITY   (Thailand)

^b Department of Electrical Engineering   (United States)

^c LINKÖPING UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION ISOTHERMS; APPROXIMATION THEORY; COMPUTATIONAL METHODS; DESORPTION; ELLIPSOMETRY; MULTILAYERS; NONDESTRUCTIVE EXAMINATION; PORE SIZE; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPIC ANALYSIS; THIN FILMS;

BRUGGEMAN EFFECTIVE MEDIUM APPROXIMATION; KELVIN-COHAN EQUATIONS; SPECTROSCOPIC ELLIPSOMETRY;

POROUS SILICON;

EID: 0035281704     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00847-3     Document Type: Article

References (34)

1. Zangooie S., Jansson R., Arwin H. J. Appl. Phys. 86:1999;850.
2. Zangooie S., Jansson R., Arwin H. J. Vac. Sci. Technol. A. 16:1998;2901.
3. Zangooie S., Bjorklund R., Arwin H. Sens. Actuators B. 43:1997;168.
4. Laurell T., Drott J., Rosengren L., Lindström K. Sens. Actuators B. 31:1996;161.
5. Zangooie S., Jansson R., Arwin H. Appl. Surf. Sci. 136:1998;123.
6. Motohashi A., Kawakami M., Aoyagi H., Kinoshita A., Satou A. Jpn. J. Appl. Phys. 34:1995;5840.
7. Herino R., Bomchil G., Barla K., Bertrand C. J. Electrochem. Soc. Solid-State Sci. Technol. 134:1987;1994.
8. Dultsev F.N., Baklanov M.R. Electrochem. Solid-State Lett. 2:1999;192.
9. Taylor D.J., Fleig P.F., Hietala S.L. Thin Solid Films. 332:1998;257.
10. Hanna K.M., Odler I., Brunauer S., Hagymassy J. Jr., Bodor E.E. J. Colloid Interface Sci. 45:1973;27.
11. Hagymassy J. Jr., Brunauer S., Mikhail R.Sh. J. Colloid Interface Sci. 29:1969;485.
12. Bodor E.E., Skalny J., Brunauer S., Hagymassy J. Jr., Yudenfreund M. J. Colloid Interface Sci. 34:1970;560.
13. Odler I., Skalny J. J. Colloid Interface Sci. 36:1971;293.
14. Odler I., Hagymassy J. Jr., Yudenfreund M., Hanna K.M., Brunauer S. J. Colloid Interface Sci. 38:1972;265.
15. Zangooie S., Bjorklund R., Arwin H. J. Electrochem. Soc. 144:1997;4027.
16. Bjorklund R.B., Zangooie S., Arwin H. Langmuir. 13:1997;1440.
17. R.M.A. Azzam, N.M. Bashara, Ellipsometry and Polarized Light, North Holland, New York, 1987.
18. Aspnes D.E. Thin Solid Films. 89:1982;249.
19. Yon J.J., Barla K., Herino R., Bomchil G. J. Appl. Phys. 62:1987;1042.
20. A. Wheeler, Catalysis 2 (1955) 118, Reinhold, New York.
21. Barrret E.P., Joyner L.G., Halenda P.P. J. Am. Chem. Soc. 73:1951;373.
22. Pierce C. J. Phys. Chem. 57:1953;149.
23. S.J. Gregg, K.S.W. Sing, Adsorption, Surface Area and Porosity, Academic Press, London, New York, 1982.
24. P.C. Hiemenz, R. Rajagopalan, Principles of Colloid and Surface Chemistry, Marcel Dekker, New York, 1977.
25. R.W. Cranston, F.A. Inkley, Advances in Catalysis, 9, 143, Academic Press, London, New York, 1957.
26. Broekhoff J.C.P., De Boer J.H. J. Catal. 9:1967;15.
27. Ihm S.K., Ruckenstein E. J. Colloid Interface Sci. 61:1977;146.
28. Rossow U. Thin Solid Films. 313/314:1998;97.
29. Dolino G., Bellet D., Faivre C. Phys. Rev. B. 54:1996;17919.
30. C. Nordling, J. Österman, Physics Handbook for Science and Engineering, Studentlitteratur, Lund, 1996.
31. J. David Segelstein, Thesis (M.S.) - Department of Physics, University of Missouri, Kansas City, 1981.
32. Halsey G.D. J. Chem. Phys. 16:1948;931.
33. Halsey G.D. Adv. Catal. 4:1952;263.
34. Brunauer S., Emmett P.H., Teller E. J. Chem. Soc. 60:1938;309.