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2
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0032291667
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PROPERTIES DEVELOPMENT DURING CURING OF LOW DIELECTRIC-CONSTANT SPIN-ON GLASSES, edited by Chien Chaing, Paul S. HO, Toh-Ming Lu and Jeffrey T. Wetzel San Francisco, CA
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Robert F. Cook, Eric G. Liniger, David P. Klaus, Eva E. Simonyi and Stephan A. Cohen in PROPERTIES DEVELOPMENT DURING CURING OF LOW DIELECTRIC-CONSTANT SPIN-ON GLASSES, edited by Chien Chaing, Paul S. HO, Toh-Ming Lu and Jeffrey T. Wetzel (Mater.Res.Soc.Proc.511, San Francisco, CA, 1998) pp. 33-38.
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Mater.Res.Soc.Proc.
, vol.511
, pp. 33-38
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Cook, R.F.1
Liniger, E.G.2
Klaus, D.P.3
Simonyi, E.E.4
Cohen, S.A.5
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3
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0032301911
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EXPERIMENTAL AND THEORETICAL STUDY OF STRUCTUREDIELECTRIC PROPERTY RELATIONSHIPS FOR POLYSILSESQUIOXANES, edited by Chien Chaing, Paul S. HO, Toh-Ming Lu and Jeffrey T. Wetzel San Francisco, CA
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Sung Mog Kim, Do Y. Yoon, Cattien V. Nguyen, Jie Han, and Richard L. Jaffe in EXPERIMENTAL AND THEORETICAL STUDY OF STRUCTUREDIELECTRIC PROPERTY RELATIONSHIPS FOR POLYSILSESQUIOXANES, edited by Chien Chaing, Paul S. HO, Toh-Ming Lu and Jeffrey T. Wetzel (Mater.Res.Soc.Proc.511, San Francisco, CA, 1998) pp. 39-47.
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, vol.511
, pp. 39-47
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Kim, S.M.1
Yoon, D.Y.2
Nguyen, C.V.3
Han, J.4
Jaffe, R.L.5
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4
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0032293101
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ADHESION ENERGY MEASUREMENTS OF MULTILAYER LOW-K DIELECTRIC MATERIALS FOR ULSI APPLICATIONS, edited by Chien Chaing, Paul S. HO, Toh-Ming Lu and Jeffrey T. Wetzel San Francisco, CA
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E. O. SHAFFER II, M. E. MILLS, D. HAWN, M. VAN GESTEL, A. KNORR, H.GUNDLACH, K.KUMAR, A.E.KALOYEROS AND R. E. GEER in ADHESION ENERGY MEASUREMENTS OF MULTILAYER LOW-K DIELECTRIC MATERIALS FOR ULSI APPLICATIONS, edited by Chien Chaing, Paul S. HO, Toh-Ming Lu and Jeffrey T. Wetzel (Mater.Res.Soc.Proc.511, San Francisco, CA 1998) pp. 133-138.
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, vol.511
, pp. 133-138
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Shaffer II, E.O.1
Mills, M.E.2
Hawn, D.3
Van Gestel, M.4
Knorr, A.5
Gundlach, H.6
Kumar, K.7
Kaloyeros, A.E.8
Geer, R.E.9
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5
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0032301798
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Integration Studies of Plasma Deposited Fluorinated Amorphous Carbon, edited by Chien Chaing, Paul S. HO, Toh-Ming Lu and Jeffrey T. Wetzel San Francisco, CA
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Thomas W. Mountsier, John A. Samuels, and Richard S. Swope in Integration Studies of Plasma Deposited Fluorinated Amorphous Carbon, edited by Chien Chaing, Paul S. HO, Toh-Ming Lu and Jeffrey T. Wetzel (Mater.Res.Soc.Proc.511, San Francisco, CA, 1998) pp. 259-264.
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(1998)
Mater.Res.Soc.Proc.
, vol.511
, pp. 259-264
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Mountsier, T.W.1
Samuels, J.A.2
Swope, R.S.3
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6
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0032299295
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FABRICATION AND CHARACTERIZATION OF SPIN-ON SILICA XEROGEL FILMS, edited by Chien Chaing, Paul S. HO, Toh-Ming Lu and Jeffrey T. Wetzel Wetzel San Francisco, CA
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S.Nitta, A. Jain, V. Pisupatti, W. N. Gill, P. C. Wayner, Jr., and J. L. Plawsky in FABRICATION AND CHARACTERIZATION OF SPIN-ON SILICA XEROGEL FILMS, edited by Chien Chaing, Paul S. HO, Toh-Ming Lu and Jeffrey T. Wetzel Wetzel (Mater.Res.Soc.Proc.511, San Francisco, CA, 1998) pp. 99-104.
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(1998)
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, vol.511
, pp. 99-104
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Nitta, S.1
Jain, A.2
Pisupatti, V.3
Gill, W.N.4
Wayner Jr., P.C.5
Plawsky, J.L.6
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7
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0032303992
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POROUS SILICA XEROGEL PROCESSING AND INTEGRATION FOR ULSI APPLICATIONS, edited by Chien Chaing, Paul S. HO, Toh-Ming Lu and Jeffrey T. Wetzel Wetzel San Francisco, CA
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CHANGMING JIN, SCOTT LIST, EDEN ZIELINSKI in POROUS SILICA XEROGEL PROCESSING AND INTEGRATION FOR ULSI APPLICATIONS, edited by Chien Chaing, Paul S. HO, Toh-Ming Lu and Jeffrey T. Wetzel Wetzel (Mater.Res.Soc.Proc.511, San Francisco, CA, 1998) pp. 213-222.
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(1998)
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, vol.511
, pp. 213-222
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Jin, C.1
List, S.2
Zielinski, E.3
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8
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0032305632
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NANOPOROUS SILICA FOR LOW K DIELECTRICS, edited by Chien Chaing, Paul S. HO, Toh-Ming Lu and Jeffrey T. Wetzel Wetzel San Francisco, CA
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T. Ramos, K.Rhoderick, R. Roth, L. Brungardt, S. Wallace, J. Drage, J. Dunne, D. Endisch, R. Katsanes, N. Vienes, and D. M. Smith in NANOPOROUS SILICA FOR LOW K DIELECTRICS, edited by Chien Chaing, Paul S. HO, Toh-Ming Lu and Jeffrey T. Wetzel Wetzel (Mater.Res.Soc.Proc.511, San Francisco, CA, 1998) pp. 105-110.
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, vol.511
, pp. 105-110
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Ramos, T.1
Rhoderick, K.2
Roth, R.3
Brungardt, L.4
Wallace, S.5
Drage, J.6
Dunne, J.7
Endisch, D.8
Katsanes, R.9
Vienes, N.10
Smith, D.M.11
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9
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0032296319
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TEMPLATING NANOPORES INTO POLY(METHYLSILSESQUIOXANE): NEW LOWDIELECTRIC COATINGS SUITABLE FOR MICROELECTRONIC APPLICATIONS, edited by Chien Chaing, Paul S. HO, Toh-Ming Lu and Jeffrey T. Wetzel Wetzel San Francisco, CA
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Julius F. Remenar, Craig J. Hawker, James L. Hedrick, Sung Mong Kim, Robert D. Miller, Cattien Nguyen, Mikael Trollsas, and Do Y. Yoon in TEMPLATING NANOPORES INTO POLY(METHYLSILSESQUIOXANE): NEW LOWDIELECTRIC COATINGS SUITABLE FOR MICROELECTRONIC APPLICATIONS, edited by Chien Chaing, Paul S. HO, Toh-Ming Lu and Jeffrey T. Wetzel Wetzel (Mater.Res.Soc.Proc.511, San Francisco, CA, 1998) pp. 69-74.
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(1998)
Mater.Res.Soc.Proc.
, vol.511
, pp. 69-74
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Remenar, J.F.1
Hawker, C.J.2
Hedrick, J.L.3
Kim, S.M.4
Miller, R.D.5
Nguyen, C.6
Trollsas, M.7
Yoon, D.Y.8
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10
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33745540453
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Fab. 16-17, Santa Clara, CA
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A. NAKASHIMA, R. MURAGUCHI, M. KOMATSU, Y. OHKURA, M. MIYAJIMA, H. HARADA, S. FUKUYAMA, Proc. 4th Intl. DUMIC Conf., p.25-30, Fab. 16-17, 1998, Santa Clara, CA.
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Proc. 4th Intl. DUMIC Conf.
, pp. 25-30
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Nakashima, A.1
Muraguchi, R.2
Komatsu, M.3
Ohkura, Y.4
Miyajima, M.5
Harada, H.6
Fukuyama, S.7
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